A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: Problem with copper plating
Problem with copper plating
2006-01-17
Nik Dee
SU-8 layer is curved up during postbake
2006-01-17
Richard Chang
2006-01-19
Andrew Xiang
2006-01-20
Richard
2006-01-30
Pradeep Dixit
Problem with copper plating
Pradeep Dixit
2006-01-30
Nik,

Try to use O2 plasma after developing to confirm the complete removal of
photoresist at the bottom. Uniformity of copper also depends upon the
electrode. I believe taht using rotaty electrode will help in improving the
uniformity of copper.

Pradeep

 1/17/06, Nik Dee  wrote:

> Hi guys. I am trying to copper plate some gold features that are
> surrounded by
> SU-8. The problem I get is that the plating takes place only in a few of
> those
> features. I want to believe that there is some residue left on top of the
> gold.
> I ve also tried longer development of the SU-8 to make sure that there is
> none
> left on the gold traces but still I get the same problem when I copper
> plate.
> Any ideas??
reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Mentor Graphics Corporation
Harrick Plasma, Inc.
MEMStaff Inc.
Process Variations in Microsystems Manufacturing