I am looking for some advice on reactive ion etching of silicon nitride.

Particularly, which photoresists would be suitable masks for RIE of a
silicon nitride layer over a Si wafer?

I am also looking for a RIE recipe to get us started.  We have SF6 and
CF4 gas available.

We'd like to then wet etch the Si wafer using the SiN as a hard mark.

Thanks for any help you may provide.

-ron

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Ron Linklater, B.A.Sc.
M.A.Sc. Candidate
Department of Materials Science and Engineering
University of Toronto
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