Hello All,

I am using photoresist AZ5214 (thickness 1.5um) as a
mask for my ICP-RIE process(SF6 gas ) and the resist
dosent last for more than 2 min . I am  looking for a
photoresist that would last atleast 10 min. Can anyone
suggest a process involving photoresist lasting for
more time regarding the above.

Thanks
Sridhar

Kuchibhatla Venkata Sridhar
MSEE, West virginia University, Morgantown ,
WV 26505, USA
304-685-8523(M)