hi sridhar,

isn´t it possible for you to use an SiO2-mask instead of only photresist?

regards,
michael

> -----Ursprüngliche Nachricht-----
> Von: Im Auftrag von K. V. Sridhar
> Gesendet: Mittwoch, 8. Februar 2006 05:38
> An: [email protected]
> Betreff: [mems-talk] Photoresist RIE
>
> Hello All,
>
> I am using photoresist AZ5214 (thickness 1.5um) as a
> mask for my ICP-RIE process(SF6 gas ) and the resist
> dosent last for more than 2 min . I am  looking for a
> photoresist that would last atleast 10 min. Can anyone
> suggest a process involving photoresist lasting for
> more time regarding the above.