Hi,
I'm trying to make a Cr Mask with concentric rings, with radius from 100-1000um
and 3um
width(Rout-Rin). I generated the pattern with L-eidt and pds2tap. But the
machine was hanging up
by the pattern. All it can made is a windmill like pattern with 4 groups of
concentric arcs (about
30 degrees). Our mask maker suggested me to generate the pattern using AutoCAD.
I'm thinking maybe
I should make a 10x scaling and do a 10x reduction photolithography later. Do
you have any
suggestions? Thanks alot!