Hi,
  I'm following the procedure to make RMS -033 photosensitive by mixing it with
2,2-dimethoxy- 2-phenylacetophenone and xylene in the ratio PDMS : Xylenes :
DMAP = 100:2:1 (weight ratio). Does anyone know if pre exposure and post
exposure bakes are required for this procedure and also about the exposure time
required. the DMAP is not dissolving in the mixtures either. I tried sonicating
the mixture for a minute. But wasn't successful. Please help me out. what am i
doing wrong.

  Vinny