Sridhar,

Maybe you can try AZ4620 or AZ9260 as the photoresist for deep ICP-DRIE. I
used to use AZ9260 photoresist to etch through 500um wafer.

Regards,

David

----- Original Message -----
From: "K. V. Sridhar" 
To: 
Sent: Tuesday, February 07, 2006 10:37 PM
Subject: [mems-talk] Photoresist RIE


> Hello All,
>
> I am using photoresist AZ5214 (thickness 1.5um) as a
> mask for my ICP-RIE process(SF6 gas ) and the resist
> dosent last for more than 2 min . I am  looking for a
> photoresist that would last atleast 10 min. Can anyone
> suggest a process involving photoresist lasting for
> more time regarding the above.