Sokwon,

The MF319 should work, although ammonium hydroxide developers are not
commonly used for AZ resists - chemically speaking, however, it is
primarily the hydroxide that is functioning, so it should work fine.

Regarding the SU-8, I have developed in acetone, which works just fine
for material removal. The biggest issue is that, when drying the
acetone, it absorbs so much heat that the temperature of the substrate
significantly drops, causing quite a bit of thermal-expansion (or in
this case, contraction) stress to the film.  It is very likely that any
interior corners of your pattern will show evidence of stress cracks.

Best Regards,
Chad Brubaker


-----Original Message-----
From: [email protected]
[mailto:[email protected]] On Behalf Of sokwon Paik
Sent: Monday, February 27, 2006 2:21 PM
To: General MEMS discussion
Subject: [mems-talk] Did anybody try to use MF319 for AZ1500
seriesdeveloper?

Hi!

  I want to use MF319 to develop AZ1518 layer ( I don't want to buy
developer if I can...I have AZ 1518 pre-coated wafers).

  According to the manual I can use most type of positive PR developer..
So, I think I can use MF 319 for my wafer and some paper state that they
used MF319 for some AZ1500 series.

  But the tehnical support person hestitate to say "yes" and instead of
say yes they said I can try to develope and then if OK then I can
use......