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MEMSnet Home: MEMS-Talk: About Sputtering Silicon NItride
About Sputtering Silicon NItride
2006-02-28
J.J wang
2006-02-28
Michael D Martin
photolithography on top of SU8
2006-03-04
[email protected]
2006-03-05
J.J wang
2006-03-05
sokwon Paik
About Sputtering Silicon NItride
Michael D Martin
2006-02-28
J.J.,
    My first suggestion on sputtering nitride films is not to do it.
The films invariably suffer from a number of problems. They are low
density and have a lot of pin holes so that they do not work well as a
masking layer. With that caviat, the sputter yield in pure argon is
quite low so use low RF power (200-150W for a 4" head) to avoid excess
target heating and perform long depositons at the lowest pressure you
can achieve.

Good luck,
   Mike Martin
   U. of Louisville

>>> [email protected] 02/28/06 1:27 AM >>>
Hi,Everyone
Right now I am trying to sputtering silicon nitride on copper and
silicon surface. Right now I have nitride target on hand. Can anyone
give me some suggestion on the sputtering parameters? Such as do I have
to have nitrogen gas flow beside the argon flow ? If yes, what is flow
rate of the argon and nitrogen ? what is the RF power as well ?
Thanks for your helps.
J.J. Wang


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