I am using a positive photoressit AZ P4620 for making a soft mask on glass
slide. Usage of HMDS is not assuring me a good adhesion of photoresist on
glass surface. The photoresist is getting etched in 5 min after I keep the
slide in concentrated HF. My main aim is to get 20u microchannel in the
glass slide. Which procedure will guarantee me a strong adhesion which can
make the photoresist soft mask to withstand concentrated HF for 30 min?. The
thickness of my photoresist soft mask if 6.5u.

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RUPESH SAWANT
Biomedical Engineering,
The University of Akron, USA.
Tel: 330.338.8546