Hi, Jason
I had some experience with double photolithography. It is basically same as
yours. SU-8 standard patterning process, followed by S1813 or 1808 patterning
process. The SU-8 and S1813/1808 patterns looked in pretty good shape.

Good luck.
J.J.Wang

[email protected] wrote: Hello all,

I am wondering is it possible to spin on positive photoresist on top of SU8(with
patterns already) and then do the photolithography?