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MEMSnet Home: MEMS-Talk: photoresist adhesion on soda lime glass
photoresist adhesion on soda lime glass
2006-03-02
Rupesh Sawant
2006-03-02
Shile
2006-03-03
Gareth Jenkins
2006-03-03
Rupesh Sawant
2006-03-06
Rupesh Sawant
2006-03-07
Gareth Jenkins
photoresist adhesion on soda lime glass
Rupesh Sawant
2006-03-06
Is that 300 deg in an oven or on a hot plate?. I have read that if we are
baking the slide in an oven then we have to keep it for a longer duration as
compared to the hot plate at the same temperature. i just want to confirm
from you.

On 3/3/06, Gareth Jenkins  wrote:
>
> Is there any reason why you use concentrated HF? My experience is that
> less aggressive solutions allow greater depths - you just have to wait
> longer. As Roger Shile suggests, use a chromium layer if possible and
> BOE. I have also had good results with 2% HF + 2% HNO4 with soda-lime
> glass.
> Without chrome I have achieved around 20microns with Shipley S1818
> resist (2um layer). If I remember correctly S1818 has it's own adhesion
> promoter so no need for HMDS. Do a thorough solvent wash followed by
> dehydration of the glass (~300 deg for 30mins) immediately before coating..
>
> Gareth
>
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