I am thinking about RIE dry etching of my II-VI
semiconductors(ZnSe and ZnCdSe based), the gas mixture
from literature I found is CH4:H2. My question is, can
I use PMMA as mask? it looks like some photoresis or
metals work.
Any one hes the idea of the mask choosing?
Thanks!!







___________________________________________________________
ÑÅ»¢1GÃâ·ÑÓÊÏä°
Ù·Ö°Ù·ÀÀ¬»øÐÅ
http://cn.mail.yahoo.com/