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MEMSnet Home: MEMS-Talk: Adhesion problem with LOR 3A resist
Adhesion problem with LOR 3A resist
2006-03-29
Ferda Mravenec
2006-03-30
Bill Moffat
2006-03-30
Shile
2006-03-30
Bill Moffat
Adhesion problem with LOR 3A resist
Bill Moffat
2006-03-30
Ferda,
      Vacuum vapor prime will vacuum dehydrate totally then apply HMDS
while the substrate is dehydrated.  The HMDS can only react with
Hydroxyl ions which are bound tightly to the substrate.  There is no
possibility of poor adhesion. Contact me for details of free test and
test of image reversal for totally controlled lift off.


Bill Moffat, CEO
Yield Engineering Systems, Inc.
2185 Oakland Rd., San Jose, CA  95131
(408) 954-8353


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