Hi, Rick,

  Thanks for your reply.
  I plan to use CF4. Do you think 10 sccm O2 flow rate would do the work?
  I am afraid that would be way too low.

Richard

----- Original Message -----
From: "Richard H. Morrison" 
To: "General MEMS discussion" 
Sent: Monday, April 03, 2006 12:27 PM
Subject: RE: [mems-talk] Pattern cross-linked SU-8


>I have etched SU8 (crosslinked) using RIE  O2 flow = 99sccm and SF6 flow =
>5sccm with 500w you get around 0.75um/min. You need the SF6 to help etch
>the Silane groups that are in the SU8, otherwise you get a surface full of
>black dots and it is very rough.
>
> Rick
>
> Rick Morrison
> Senior Member of the Technical Staff
> The Charles Stark Draper Laboratory