Is sputtering possible on a wet etched glass substrate. Especially
when electtrode has to be sputtered in the wet etched microchannel. i
have a reference in which the sputtering can be done on an etched
glass channel. But in that case the depth of the glass microchannel is
8 um. So the sides of the microchannel is almost vertical.  The depth
of my microchannels on glass is 50 um. So in my case the isotropic
etching will have lot of effect on the side walls of the channel. Can
sputtering assure me a continuos electrode length within the channel.

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RUPESH SAWANT