Hi All,

I have a lift-off pattern made of 0.75 microns thick Au with a base layer of 5
nm Cr on poly(methyl methacrylate) (PMMA) substrate.  I am wondering if anyone
has a  lift-off etch process that I can adapt.   I am aware that Si lift-off
metallization does not work on plastics, and I have to use etch chemistry.

Also, does anyone have any experience with shadow masks for deposition of 0.75
microns thick metal for the smallest feature size of 50 microns?

Thanks,
Jayna