Hello Jay,

I use a HD8820 polyimide and it works very well.
After spinning and patterning you need to cure the polymer at 280C for 2-3
hours in N2 or Ar atmosphere.
To release the suspended part, I ash off the poly - dry etch in pure O2 at
250C, 1200 watts.

Hope this can help.
Good luck,

Giuliano



On April 19, 10:24 pm "J.J wang"  wrote:
> Dear All,
> I am trying to deposit a suspended metal layer over a sacrificial
> layer. Is any material that can be used as a sacrifical layer that:
> 1) Can be removed without using ultrasonic bath. The ultrasonic bath
> seem to liftoff my metal structure as well. 2) Can be removed without
> RIE etching. The RIE etching has to be isotropic in order to etch out
> the underneath sacrificial layer. Our nanofacility doesn't have a very
> good etcher.
>
> I tried NR7, but it is pretty sticky, without utlrasonic, it is very
> hard to remove completely. Can I use SU-8 ?
>
> Any help and suggestion will be highly appreciated.