Dear All,

When I do photolithography on glass substrate I found
two problems:
1) The pattern cannot develop well on the photoresist
(LOR + S1805), although I found that there is no such
problem for using SiO2 as substrate.
2) It is extremely difficult to lift-off the metal
layer (50nm Cr and 400nm Au). I put the substrate in
CD-26 for 2 day but no metal comes out.

Can someone give me ideas to solve the problems?
Thanks a lot in advance,
Alex