Dear Alex,

            If you are facing such a problem then you may go for Desccum in
Oxygen plasma after patterning the LOR before metallization, keeping O2 at
51 SCCM and 50 W the power with pressur earound 45 mT.

This can imrove you Problem, apart from you may also try Acetone at 40
degree celcius for about 15 minutes for liftoff and after rinse dry you may
go for a breif dip in Remover PG for 2 minutes @ 40 degree celcius temp.

Best Wishes,

Manish Hooda
----- Original Message -----
From: "Alex Wong" 
To: 
Sent: Tuesday, May 02, 2006 3:22 AM
Subject: [mems-talk] photolithography on glass problem


> Dear All,
>
> When I do photolithography on glass substrate I found
> two problems:
> 1) The pattern cannot develop well on the photoresist
> (LOR + S1805), although I found that there is no such
> problem for using SiO2 as substrate.
> 2) It is extremely difficult to lift-off the metal
> layer (50nm Cr and 400nm Au). I put the substrate in
> CD-26 for 2 day but no metal comes out.
>
> Can someone give me ideas to solve the problems?