Try LPCVD Nitride for KOH etching.

Ziaur Rahman  wrote:  I need to do anitropic etching of Si
and planning to etch around 200 um.
As we do not have DRIE we have to do wet etching. I tried KOH solution
with different kind of masks like PECVD Nitride, Cr, Cr and Gold. But nothing
survived more than 2 hours. So I am planning to use TMAH for etching.

What kind of material can survive without peeling for more than 3 hours in TAMH?
I want to use sputter Cr. Is it a good idea? I know a lot of people are using
oxide and nitrides. But I prefer to use Cr as I have to etch for long time.

Any suggestions, comments will be highly appreciated.


Pramod Gupta
21084 Red Fir Court
Cupertino, CA 95014
Phone: (408) 253-1646