Hi all,
          I am working on the Coventorware software. In the structure I have
the Si3N4 membrane, which is at the 1.2µm above from the substrate. The
membrane looks like a rectangle type structure. It has the central plate of
30 x 30 µm2, which is supported by the four beams of 20 x 5 µm2. The other
ends of the beam are fixed.

          First I optimized the meshing such that I got the same results for
two different meshing. After that I did the pull in analysis in this
software. I am getting the deflection more the 1/2 (0.64 µm) of the original
gape at the pull in voltage, while it should be around 1/3 (0.4µm) of the
original gape. I am facing this problem not only for this structure for
other structures also. The fix-fix beam of the size of 70 x 30 µm2 , I am
getting the deflection correspond to pull in voltage is 0.773µm.

         If any one has the knowledge of this problem then please reply. I
can directly contact you if you will allow.


Kind Regards
Deepak
IIT Madras