I am using AZ P4620 photoresist to make a masking layer on a soda lime
glass. Is it necessary to have a wait time between the soft bake and
exposure process and also after exposure? the specification sheet tell
to keep a wait time between the processes which i have mentioned. But
that specification sheet is for silicon as a substrate. Do i need to
keep wait time if i am using glass as a substrate and if yes then why?

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RUPESH SAWANT