You need 30min before exposure at 60% humidity, cause it require some water
vapor adsorbing into. It will improve resolution and profile more.
This is just from my experience.

Jaephil Do, Graduate Research Assistant
Microsystems and BioMEMS Lab. Rhodes hall #919
Dept. of ECECS, University of Cincinnati
Cincinnati, OH 45221-0030
Phone: (513) 556-0852, Fax: (513) 556-7326
eMail: [email protected]
-----Original Message-----
From: [email protected] [mailto:[email protected]]
On Behalf Of Rupesh Sawant
Sent: Saturday, June 17, 2006 6:32 PM
To: General MEMS discussion
Subject: [mems-talk] wait time for AZ P4620 for a glass substrate

I am using AZ P4620 photoresist to make a masking layer on a soda lime
glass. Is it necessary to have a wait time between the soft bake and
exposure process and also after exposure? the specification sheet tell
to keep a wait time between the processes which i have mentioned. But
that specification sheet is for silicon as a substrate. Do i need to
keep wait time if i am using glass as a substrate and if yes then why?