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MEMSnet Home: MEMS-Talk: Photoresist for sacrificial etch
Photoresist for sacrificial etch
2006-06-29
Darius Virzonis
Photoresist for sacrificial etch
Darius Virzonis
2006-06-29
Hi all.

I need an advice in finding the manufacturer/supplier of photoresist suitable
to form the sacrificial layer (500 nm thick) itself. This is to be used for
sacrificial release of silicon nitride as a constructive material.

Any comments regarding employing the photoresists as a sacrificial material
would be also appreciated.

Thanks in advance.

Darius

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