You may add a little argon to cl2. That can etch the native oxide.

On 7/13/06, Martin Aguilar  wrote:
>
> Hi,
>
> I'm trying do dry etch aluminum thin films (~250 nm). The problem is
> that standard dry etching reciped for Al include BCl3 to get rid of
> the native oxide layer, and I don't have that gas. I have Cl2, CF4,
> SF6, N2, HBr... Is there a way to get the job done with those gases?