Kim,
Fluorine is not used to make SiN it is used to clean the chamber. PECVD
amorphous silicon recipe with nitrogen or ammonia should do the trick.

P.S. A target index of refraction at 632nm will help if you need to have
someone make this for you.

Best Regards,
Glenn Silveira

-----Original Message-----
From: K Saw [mailto:[email protected]]
Sent: Sunday, July 23, 2006 7:23 PM
To: [email protected]
Cc: [email protected]
Subject: [mems-talk] silicon nitridation poser


Dear All,

I would like to know how I can obtain a nitrided Si layer on a Si wafer.
The top overlayer of SiN should about 2 or 3 micron. Is fluorine used in
the process?

Thanks.

Kim

[email protected]