Hi,

If you have large areas of SU-8 a thermal shock - heat the wafer and cool in
water - might do it. Otherwise think about a SU-8 which has a bad adhesion to
your substrate (e.g. HMDS priming prior to spinning or sacrificial photoresist).
As already mentioned, etching SU-8 will be difficult.

Regards

Michael Zickar

--------------------------------------------
Institute of Microtechnology
University of Neuchatel
Switzerland


-----Original Message-----
From: [email protected] [mailto:[email protected]] On
Behalf Of J.J wang
Sent: Montag, 24. Juli 2006 20:31
To: General MEMS discussion
Subject: Re: [mems-talk] SU 8 removal

Hi Jeff.
The OmniCoat will help removal of the SU-8. You can try to apply it before SU-8.
Good luck
J.J. Wang

Jeff chen  wrote: Hi, all,

Does anyone have some experience to completely remove SU8 after development?
I tried PG Remover and it didn't work well. And also plasma cleaning
under oxygen, still not working.