Hi,

Removal PG (heat and stir, >6 hours) works very well to remove SU8.

Sincerely,

Zhiwei Zou

Graduate Research Assistant
Microsystems and BioMEMS Laboratory
Center for BioMEMS and NanoBiosystems
Dept. of Electrical and Computer Engineering and Computer Science
919 Rhodes Hall, Cincinnati, Ohio 45221-0030
University of Cincinnati

(Phone): 513-556-0852 (Fax): 513-556-7326
(E-mail): [email protected]
(Website): http://www.ececs.uc.edu/~zouz

====================================================
-----Original Message-----
From: [email protected] [mailto:[email protected]]
On Behalf Of ZICKAR Micha?l
Sent: Wednesday, July 26, 2006 7:35 AM
To: General MEMS discussion
Subject: RE: [mems-talk] SU 8 removal

Hi,

If you have large areas of SU-8 a thermal shock - heat the wafer and cool in
water - might do it. Otherwise think about a SU-8 which has a bad adhesion
to your substrate (e.g. HMDS priming prior to spinning or sacrificial
photoresist). As already mentioned, etching SU-8 will be difficult.