Hi all,

  I have been patterning structures into PMMA using an Electron beam lithography
system. I was wondering if anyone had any advice on  capturing an image of the
cross section for the patterned structure (post-development) using an SEM.

  My attempts so far have failed. Cleaving sidewards across a pattern seems to
destroy the pattern on the cleaved sample. I have also tried sputter coating the
to ensure little damage to the resist when viewing under SEM. If anyone has any
advice or know any "tricks" for captuign cross-sectional images, I would be
grateful! Cheers, Jeff Kettle