Dear all,

I am trying to use SU-8 photoresist as the etch mask for the DRIE etch of
Si substrate ( ~5um (or above) thick resist is needed). Did anyone have any
experiences in this? What is the selectivity of the typical Bosh process
between SU-8 and Si? And how can I pattern it (typical recipe for UV
exposure and development)? I have not used SU-8 before and hope someone can
give me a hand. Many thanks.

Best wishes,

--
Xiang Zhou
PhD candidate
Semiconductor Physics Group
Cavendish Laboratory
University of Cambridge