Dear Bhat,

Thanks for your comments. I read in a journal that one way is to use SiCl4 +
NH3. Any chance of using SiF4 + NH3?

Regards,
Kim



---------- Original Message ----------------------------------
From: VS Bhat 
Reply-To: General MEMS discussion 
Date:  Sat,  5 Aug 2006 15:38:40 +0530

>Kim,
>May be, you could try CVD to deposit the film
>bhat
> Quoting Glenn Silveira :
>
>> Kim,
>> Fluorine is not used to make SiN it is used to clean the chamber. PECVD
>> amorphous silicon recipe with nitrogen or ammonia should do the trick.
>>
>> P.S. A target index of refraction at 632nm will help if you need to have
>> someone make this for you.
>