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MEMSnet Home: MEMS-Talk: Unstable TMAH etching through wafer
Unstable TMAH etching through wafer
2006-08-24
Le Cao Hoai Nam
2006-08-24
Joseph Grogan
2006-08-24
Dylan Morris
2006-08-24
Michael D Martin
2006-08-27
Le Cao Hoai Nam
2006-08-30
Michael D Martin
2006-08-31
[email protected]
2006-08-31
Carlo Webster
Unstable TMAH etching through wafer
Dylan Morris
2006-08-24
Nam

It has been noticed that stainless steel in a KOH solution contaminates the
bath and will make etched surfaces very rough (we also found this out the hard
way here) by leaving a residue on the surface. I don't see why that couldn't
happen in TMAH as well. PEEK is a better material for the chip holder.
Reference below.

T A Kwa et al  1995 J. Micromech. Microeng. 5 95-97

Dylan J. Morris, Ph.D.
Washington State University
Center for Materials Research
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