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MEMSnet Home: MEMS-Talk: Regarding Glass lithography
Regarding Glass lithography
2006-08-29
Kannan Ramaraj
2006-08-29
Gareth Jenkins
2006-08-30
Marc Häfner
Re: AW: [mems-talk] Regarding Glass lithography
2006-08-30
sokwon Paik
2006-09-01
walter essinger
2006-09-01
Xiaoguang "Leo" Liu
2006-09-03
walter essinger
2006-08-29
Bill Moffat
2006-08-30
Gareth Jenkins
2006-08-31
Kirt Williams
Regarding Glass lithography
Bill Moffat
2006-08-29
Use vacuum vapor prime deposition of HMDS to make the resist stick
forever.

Bill Moffat, CEO
Yield Engineering Systems, Inc.
2185 Oakland Rd., San Jose, CA  95131
(408) 954-8353


-----Original Message-----
From: [email protected]
[mailto:[email protected]] On Behalf Of Kannan Ramaraj
Sent: Tuesday, August 29, 2006 3:51 AM
To: [email protected]
Subject: [mems-talk] Regarding Glass lithography

Hi all!
    I am trying to make one-dimensional groove pattern over the glass
surface with a width and depth ranging from 50micron to 200 micron. I
laminated dry photoresist over the glass surface and prepared the
pattern in the glass surface. Photoresist is not staying more than 1
minute if i put it in dilute HF. And also I read in this site that I can
use Chromium as a sacrificial layer. But I don't have chromium with me.
Can you suggest some other material as a sacrificial layer ? Whether I
have to coat my sacrificial layer before or after the photoresist ?
Please give some idea to overcome this issue.
          Thanks!
                                  With regards,
                                    R.Kannan
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