Use pecvd oxide
shay

-----Original Message-----
From: [email protected] [mailto:[email protected]]
On Behalf Of Xiaoguang "Leo" Liu
Sent: ה 31 אוגוסט 2006 23:24
To: General MEMS discussion
Subject: [mems-talk] Metal mask for DRIE

Dear all
I'm trying to do a  through wafer etch (550um) using silicon Deep RIE.
I've tried with the AZ9260 photoresist. However, the reflow of the
photoresist after hard bake makes the etching profile non-uniform.

Does anybody know if metal can be used in the DRIE process. I've heard
that people have done 2mm etching using Ni as a mask. However, our
staff here says metal is not allowed in the chamber. It would be great
if anybody could give some references on that. Thanks a lot