A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: Metal mask for DRIE
Metal mask for DRIE
2006-08-31
Xiaoguang "Leo" Liu
2006-09-01
Florian Herrault
2006-09-01
Xiaoguang "Leo" Liu
2006-09-01
shay kaplan
2006-09-01
Hongjun-ECE
2006-09-01
Nicolas Duarte
2006-09-01
Nicolas Duarte
2006-09-01
Xiaoguang "Leo" Liu
2006-09-01
Hongjun-ECE
2006-09-01
gilgunn
2006-09-05
Pradeep Dixit
metal etching with the thickness > 30 um
2006-09-05
Feng-Yuan Zhang
Metal mask for DRIE
Hongjun-ECE
2006-09-01
Metal in DRIE contaminates the chamber and the sample surface. An optimized
AZ9260 should do the job. Another (might be better) option is use SPR220,
which has higher selectivity.

Good luck,

Hongjun

------------------------------------
Hongjun Zeng, PhD
MEMS/Nano Scientist
Nanotechnology Core Facility
(NCF formerly MAL)
University of Illinois at Chicago
3064 ERF Building
842 W. Taylor St., Chicago, IL 60607
Tel. 312-355-1259, Fax: 312-413-0447
------------------------------------
reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
MEMStaff Inc.
Process Variations in Microsystems Manufacturing
Nano-Master, Inc.
Tanner EDA by Mentor Graphics