Dear colleagues,

I am doing EBL on non-conductive substrate. I deposited 5-12 nm silver film
on the PMMA 495 C5. I believe the EBL was performed pretty well because I
can clearly see the latent image of the exposed patterns before and after
the silver etching. But the problem happened at the step of development: the
developer (MIBK 1:3 IPA) washed away all PMMA no matter it is exposed or
not! Did you see this phenomenon before and do you have any suggestion?

Thanks,

Hongjun

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Hongjun Zeng, PhD
MEMS/Nano Scientist
Nanotechnology Core Facility
(NCF formerly MAL)
University of Illinois at Chicago
3064 ERF Building
842 W. Taylor St., Chicago, IL 60607
Tel. 312-355-1259, Fax: 312-413-0447
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