Dear all,

I am fabricating micro-porous Si through anodization from the back side of
wafer using HF-ethanol solution. The front surface becomes very rough after
anodization. I need to protect this surface by depositing or spin coating
something. The condition for protection layer is conductive and resistant to
HF solution. Please let me know if you have any idea about these protection
materials.

Thank you in advance.

J.Kim