I would like to know if you knew about any dry etching techniques which would
help me etch single crystal Silicon (approximately 55 nm) using a thinned out AZ
resist as a mask. We have been experimenting with different gasses and their
combinations in a micro RIE. CF4 and O2 can not be used since the both attack
the AZ resist. We have no provisions in the clean room to use HBr or Chlorine.

  Thanks
  Sharukh