Dear Issac
I think your questions are very relavent to all people doing
lithography. Could you recommend some reference for that? Thanks
Best
Leo

On 9/29/06, Isaac Chan  wrote:
> XiaoQiang,
>
> Is the recommended dose rated at the resist thickness you use? If your
> resist is thicker than the rated setting, you need more dose. If the rated
> dose is for i-line or g-line only, it is not very useful for your
> broadband exposure because your dose is contributed from 350-500nm,
> although peaked at 356, 405, and 436nm. Did you set the intensity control
> on Ch1 (365nm i-line) or Ch2 (405nm h-line)? Do you use contact or
> proximity exposure? For contact exposure, the intensity profile should be
> sharp. For proximity exposure, did you leave the gap too wide? Do your
> photomask patterns have sharp or transition edges (Cr mask vs. emulsion
> mask)? If you mask patterns are not sharp, your intensity profile is not
> sharp as well.
>
> Regards,
>
> Isaac
>
>