Try vacuum vapor priming of HMDS on wafer before resist application.  It
will give the most adhesion between wafer and resist.
Bill Moffat, CEO
Yield Engineering Systems, Inc.
2185 Oakland Rd., San Jose, CA  95131
(408) 954-8353


-----Original Message-----
From: [email protected]
[mailto:[email protected]] On Behalf Of jianshi
Sent: Thursday, October 05, 2006 10:19 AM
To: 'General MEMS discussion'
Subject: ??: [mems-talk] photoresist peeled off together with PDMS

Hello

Maybe before coating resist on Si wafer, coat a layer of primer

>Recently I was confused by a problem. When I peeled off PDMS from the
>master coated photoresist of shipley 1818, the photoresist was always
>peeled off together with PDMS. Before curing PDMS, the master had been
>exposed to a vapor of the chemical of chlorinated silane to facilitate
>easy removal of PDMS. Can anyone give me a help? Thanks in advance.