Dear XHeng,
You can try CMP(Chemical Mechanical Polishing) after KOH etching which may
give the roughness around 2-10nm or KOH with 80% at 80degrees will give
smoothness. But etch rate will be low.
Sujatha
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---------- Original Message -----------
From: XiongHeng 
To: [email protected]
Sent: Thu, 05 Oct 2006 23:19:06 +0800
Subject: [mems-talk] How to Get a mirror-like surface of silicon(100) using
KOH wet silicon etch.

> Dear MEMS experts,
>   I  have a need to have a mirror-like  surface of silicon(100)
>  using KOH wet silicon etch.   When I used conventional KOH etching,
> the solutions that I experiment was "40% sol. at 80 deg" and "30%
> sol. at 80 deg".But the roughness of the etched surface(100) is bad,
> Can't achieving our demand.   I want to look for a solution which
> can achieve mirror-like suface using KOH etching.