---- Original message ----
>Date: Fri, 13 Oct 2006 13:50:58 -0400
>From: Bo Bob Huo 
>Subject: [mems-talk] photoresist peeled off together with PDMS
>To: [email protected]
>
>Dear all,
>
>Thanks for the suggestions given by some guys. I put a droplet of
>chlorinated silane near the wafer in vaccum jar but the PDMS was
>still peeled off together with phtoresist. All the chemicals were
>newly purchased and in good state.
>
>Overdeveloping may cause this problem? Does anyone encounter this
>problem? And how do you solve it? Thanks.
>
>Bob


Sorry to hear that. Another way you can try is to postbake few minutes after
development. Even though Shipley photoresist doesn't need postbake, Someone told
me that 1-5 minutes postbake may help adhesion.
Huaibin
Huaibin Zhang

Chemistry Department
University of Illinois
Office: MRL 3011
104 S. Goodwin Avenue,
Urbana, IL 61801
Tel: (home)217-344-5282
Tel: (office)217-265-5068
email: [email protected]