Hello,

Just wondering if anyone has experience using TRION's Mini-lock II ICP
etcher for III-V's (GaAs)?

Specifically, I am finding it pretty hard to control the plasma reflected
power to below 10%.

I am using a chlorine based etch recipe (Ar / Cl2 / BCl3).  However, I'm all
ears if someone's got a working recipe for a TRION machine.

Also, could anyone who has had hardware issues with these etchers also chime
in as maybe that is the cause of my troubles.

Thank you,


Bhavin Bijlani
University of Toronto, Photonics