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MEMSnet Home: MEMS-Talk: Anisotropic Wet Etching of Silicon nitride
Anisotropic Wet Etching of Silicon nitride
2006-11-28
[email protected]
2006-11-28
[email protected]
2006-11-29
Roger Brennan
2006-11-29
[email protected]
2006-11-29
[email protected]
Ingredient of s1813 and toluene
2006-11-30
Bin Liu
2006-11-30
Roger Shile
Anisotropic Wet Etching of Silicon nitride
Roger Brennan
2006-11-29
Do not ALL wet etches act isotropically?

Roger Brennan
Applications Director
Solecon Labs
770 Trademark Drive
Reno, NV 89521-5926
[email protected]
775-853-5900

-----Original Message-----
From: [email protected]
[mailto:[email protected]]On Behalf Of [email protected]
Sent: Tuesday, November 28, 2006 2:29 PM
To: [email protected]
Subject: Re: [mems-talk] Anisotropic Wet Etching of Silicon nitride


Ed:

It would be much easier to plasma etch silicon nitride anisotropically. I
don't know of a masking material that would hold up to 180 degree C.
Phosphoric Acid bath. Bob Henderson


-----Original Message-----
From: [email protected]
To: [email protected]
Sent: Tue, 28 Nov 2006 12:28 PM
Subject: [mems-talk] Anisotropic Wet Etching of Silicon nitride

Dear colleagues,

Does anybody knows a way how to ANISOTROPICALLY wet etch Silicon Nitride?
reply
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