It is LPCVD silicon nitride. Thickness is 70nm.
Under silicon nitide there are 20nm of LPCVD silicon dioxide.
Silicon dioxide is etched by KOH, right ? And so the underlying silicon
dioxide layer was removed. Maybe this is the cause i've lost cantilevers and
bridges ?

Best regards,
Andrea


----- Original Message -----
From: "shay kaplan" 
To: ; "'General MEMS discussion'"

Sent: Wednesday, December 06, 2006 6:05 PM
Subject: RE: [mems-talk] silicon nitride bridges and cantilevers

> If it is not LPCVD nitride they will be etched out by KOH. Even LPCVD
> nitride will etch but slowly.