Dear Barbara,
Try to use a metal mask e.g. Cr.
After patterneing the Cr layer don't remove the resit befor BHF etching..
regards,
Peter Kuijpers
Philips
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"Barbara Cortese"
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[mems-talk] Quartz wet etching
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2006-12-14 05:10 PM
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General MEMS
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Dear all
I'm wet etching quartz with a BHF solution 6:1, but I have encounterd some
difficulties in etching.
What I do is a photolithographic process on the quartz substrate, a
hardbake of 4 hours at 180° and then the wet etching process.
What I obtain though is the rearrangement of the photoresist in a
disordered pattern and no etching!
Has anyone an idea where I go wrong?
Barbara
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