It looks like Peter's suggesting wet etching the Cr with your mask. For
lift-off, you would have to image-reverse your mask.

Jesse Fowler

"Barbara Cortese" 
Subject Re: [mems-talk] Quartz wet etching

Dear Peter
Are you suggesting to evaporate a Cr layer after developing the
photoresist and no hardbake?
Don't you think it could be a problem of the type of photoresist?