Hi

I am trying to etch LPCVD deposited and boron doped by diffusion (10^17
to 10^19) layer. This layer has a thickness of 0.5 um and sitting on top
of LPCVD grown ~ 2um thick silicon nitride layer. Can anyone help me
with this? Any references or ideas will be appreciated. Thank you.


Mukti M Rana

The University of Texas at Arlington