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MEMSnet Home: MEMS-Talk: Refractive Index of Photoresists
Refractive Index of Photoresists
2007-02-09
Martyn Gadsdon
2007-02-09
Robert Black
2007-02-12
mohendra roy
2007-02-09
Bill Moffat
2007-02-09
Roger Shile
2007-02-13
Bill Moffat
2007-02-11
Shay Kaplan
Refractive Index of Photoresists
Robert Black
2007-02-09
In my experience, the refractive index does not change much between
unexposed and exposed photoresist. The thickness of the resist is a bigger
factor. This is why swing curves are used to determine what thickness to
use.

-----Original Message-----
From: [email protected] [mailto:[email protected]]
On Behalf Of Martyn Gadsdon
Sent: Friday, February 09, 2007 8:20 AM
To: [email protected]
Subject: [mems-talk] Refractive Index of Photoresists

Dear All,

I am interested in finding out what the difference in refractive index is
between un-exposed (with uv radiation) and exposed photoresist. Particularly

I am interested in knowing what photoresist (or other substance that can be
applied by spinning) will give me the most difference in refractive index
between exposed and unexposed areas.
reply
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